Aryl Addition Chemistry on Scale: A Case for the Application of Flow Chemistry to Minimize Unexpected Impurities

Tuesday, April 3, 2012: 2:30 PM
340A (Hilton of the Americas)
Michele Drexler1, Nga Do2, Matt Weekly2, Mark Olivier2 and Jade Nelson2, (1)CRD - Engineering Technologies, Pfizer Global Research and Development, Groton, CT, (2)Pfizer Global Research & Development

Aryl Addition Chemistry on Scale: A Case for the Application of Flow Chemistry to Minimize Unexpected Impurities

Nga Do, Michele T. Drexler*, Mark Olivier, Matt Weekly, and Jade Nelson 

Chemical Research & Development

Pfizer Global Research & Development

Groton, CT

During evaluation of the key aryl addition for scale of a pharmaceutical intermediate, two impurities were observed during the initial halogen-metal exchange reaction of the aryl bromide 1 with n-BuLi in 2-Me-THF solvent. These impurities (3 and 4) were observed at combined levels up to 50% (UPLC) area and were evident at all temperatures between -20°C and -78°C.  To minimize these impurities by providing more efficient heat and mass transfer for the system, flow chemistry was explored. This presentation will discuss the optimization of the halogen-metal exchange portion of the aryl addition chemistry and the application of a continuous reaction setup to provide a process for scaling the pharmaceutical intermediate.


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See more of this Session: Productivity Enhancement by Process Intensification I
See more of this Group/Topical: Process Development Division