Aryl Addition Chemistry on Scale: A Case for the Application of Flow Chemistry to Minimize Unexpected Impurities
Nga Do, Michele T. Drexler*, Mark Olivier, Matt Weekly, and Jade Nelson
Chemical Research & Development
Pfizer Global Research & Development
Groton, CT
During evaluation of the key aryl addition for scale of a pharmaceutical intermediate, two impurities were observed during the initial halogen-metal exchange reaction of the aryl bromide 1 with n-BuLi in 2-Me-THF solvent. These impurities (3 and 4) were observed at combined levels up to 50% (UPLC) area and were evident at all temperatures between -20°C and -78°C. To minimize these impurities by providing more efficient heat and mass transfer for the system, flow chemistry was explored. This presentation will discuss the optimization of the halogen-metal exchange portion of the aryl addition chemistry and the application of a continuous reaction setup to provide a process for scaling the pharmaceutical intermediate.
See more of this Group/Topical: Process Development Division
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