| Tuesday, 24 April 2007: 2:00 PM-5:00 PM | |||
| Room 336 A (Hilton Americas-Houston) | |||
Systems and Process Control (10b) | |||
| #76 - Process Control and Monitoring Applications (10B01) | |||
| This session deals with novel process control and monitoring applications. Papers describing real-time implementation of advanced process control and monitoring are of higher priority. | |||
| Chair: | Tyler A. Soderstrom | ||
| CoChair: | Juergen Hahn | ||
| 2:00 PM | 76a | A Novel Mixed Product Run-to-Run Control Algorithm – Dynamic Ancova Approach Ming-Da Ma, Chu-Cheng Chang, Shi-Shang Jang, David Shan-Hill Wong | |
| 2:25 PM | 76b | A Practical Approach to Advanced Process Control of VCM Plants Ravi Nath, Mike Yen, Zak Alzein, Eric Wagner | |
| 2:50 PM | 76c | Direct Control of Chemical Processes with Multi-Rate Measurements Sairam Valluri, John Jordan | |
| 3:15 PM | 76d | Model Based Online Analysis and Monitoring of Tank Qualities Suresh S. Agrawal | |
| 3:40 PM | 76e | Development of in-Situ Analysis for the Chemical Industry J.D. Tate, Trevor Knittel | |
| 4:05 PM | 76f | Process Monitoring Using Robust Chemometric Spectrum Models for Predicting Concentration Profiles Uwe Kruger, Yan Zhou, David Rooney, Xun Wang, Jillian Thompson | |
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