Tuesday, 24 April 2007: 2:00 PM-5:00 PM
Room 336 A (Hilton Americas-Houston)

Systems and Process Control (10b)

#76 - Process Control and Monitoring Applications (10B01)
This session deals with novel process control and monitoring applications. Papers describing real-time implementation of advanced process control and monitoring are of higher priority.
Chair:Tyler A. Soderstrom
CoChair:Juergen Hahn
2:00 PMA Novel Mixed Product Run-to-Run Control Algorithm Dynamic Ancova Approach
Ming-Da Ma, Chu-Cheng Chang, Shi-Shang Jang, David Shan-Hill Wong
2:25 PMA Practical Approach to Advanced Process Control of VCM Plants
Ravi Nath, Mike Yen, Zak Alzein, Eric Wagner
2:50 PMDirect Control of Chemical Processes with Multi-Rate Measurements
Sairam Valluri, John Jordan
3:15 PMModel Based Online Analysis and Monitoring of Tank Qualities
Suresh S. Agrawal
3:40 PMDevelopment of in-Situ Analysis for the Chemical Industry
J.D. Tate, Trevor Knittel
4:05 PMProcess Monitoring Using Robust Chemometric Spectrum Models for Predicting Concentration Profiles
Uwe Kruger, Yan Zhou, David Rooney, Xun Wang, Jillian Thompson

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