45 Plasma and Electrochemical Deposition Techniques

Sunday, November 13, 2016: 3:30 PM - 6:00 PM
Golden Gate 5 (Hilton San Francisco Union Square)
This session will examine recent advances in the fundamental study and application of plasma processes, gas phase and electrochemical deposition techniques, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE), electrochemical deposition and related approaches. Both experimental and theoretical contributions to this session are encouraged.

Electronics and Photonics

Elijah Thimsen
Email: elijah.thimsen@wustl.edu

Selma Mededovic Thagard
Email: smededov@clarkson.edu

3:30 PM

4:18 PM
(45d) Topographically Selective Deposition of Dielectrics Using Ion Implantation
Dara Bobb-Semple, Fatemeh Hashemi, Yin Fan, Tobin Kaufman-Osborn and Stacey F. Bent

4:34 PM

5:12 PM
(45g) Chiral Templating of Self-Assembling Nanostructures By Circularly Polarized Light
Jihyeon Yeom, Bongjun Yeom, Joong Hwan Bahng, Petr Král and Nicholas Kotov

5:28 PM
(45h) Anomalous ALD Growth per Cycle Under Precursor-Limited Conditions
Andrew Poissant, Hossein Salami and Raymond A. Adomaitis
See more of this Group/Topical: Materials Engineering and Sciences Division