480510 Porous Aluminum Oxide: Templates for High Throughput Production of Highly Ordered Metallic Nanowires
Conventionally, the procedures to fabricate 1-D nanostructures in desired device configuration requires expensive electron beam lithography or spatially limited photolithographic techniques. Herein we overcome this challenge by using inexpensive ordered alumina oxide membranes, which acts as a growth template and a structure directing agent for nanowire growth. Aluminum was chosen as a base for nanowire templates because of its low cost, (0.80 dollars per m2)  and material availability.
A modified anodization procedure [2,3,4] was used for generation of high density hexagonally ordered homogeneous nanopore arrays with tunable pore diameters, interpore distance and pore lengths. Pore diameters were controllably tuned from 30 to 80nm. Pore diameter ranges are dependent on pore density, which is determined by anodization conditions. Pore diameter growth rate was calculated to be 5.4nm per minute and pore length growth was optimized and found to be 1μm per 12 minutes. Collectively, enabling us to create high-density nanostructures with aspect ratios (L/D) ranging from 33 to 12.5. Pore densities were calculated to be 14.6 billion pores per cm2, with interpore distances of 96nm. Scanning electron microscope (SEM) techniques were used to characterize pore diameter, pore density and interpore distance. Methods of electrodeposition of silver and other semiconducting materials with desired functionalities are currently being investigated 
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