472934 Microplasmas for Substrate-Independent Deposition of Nanostructured Metals and Oxides

Monday, November 14, 2016: 8:18 AM
Golden Gate 4 (Hilton San Francisco Union Square)
Michael Gordon, Chemical Engineering, University of California Santa Barbara, Santa Barbara, CA, Andrew Pebley, Materials, UCSB, Santa Barbara, CA and Katie Mackie, Chemistry, UCSB, Santa Barbara, CA

A general, substrate-independent method for plasma deposition of nanostructured, crystalline metals and oxides will be presented. The technique uses a flow-through, micro-hollow cathode plasma discharge (supersonic microplasma jet) with remote ring anode to deliver a highly-directed flux of growth species to the substrate. A diverse range of nanostructured materials, e.g., metals (Cu, Ni, Pd), oxides (CuO, SnO2, NiO, Fe2O3, CoxOy), doped oxides (FexNi1-xO), and spinels (NiFe2O4) with different morphologies (nanoparticles, dense columnar films, or hierarchical nanostructures) can be deposited at room temperature on virtually any substrate (conductors, insulators, plastics, fibers, and patterns) in a conformal fashion. The effects of deposition conditions, substrate type, and patterning on film morphology, nanostructure and surface coverage will be highlighted. The microplasma synthesis approach presented herein provides a general and tunable method to deposit a variety of functional and hierarchical metal/oxide materials on many different surfaces. High surface area, conversion-type CuO electrodes for Li-ion batteries are demonstrated as a proof-of-concept example.

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See more of this Session: Nanostructured Thin Films
See more of this Group/Topical: Materials Engineering and Sciences Division