28 Plasma and Electrochemical Deposition Techniques

Sunday, November 8, 2015: 3:30 PM - 6:00 PM
251D (Salt Palace Convention Center)

This session will examine recent advances in the fundamental study and application of plasma processes, gas phase and electrochemical deposition techniques, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE), electrochemical deposition and related approaches. Both experimental and theoretical contributions to this session are encouraged.

Electronics and Photonics
Selma Mededovic Email: smededov@clarkson.edu
Charles W. Monroe Email: cwmonroe@umich.edu
See more of this Group/Topical: Materials Engineering and Sciences Division