429228 iCVD Top-Coat for Sub-10nm Patterning with Directed Self-Assembly of Block Copolymer Film

Wednesday, November 11, 2015: 3:35 PM
253A (Salt Palace Convention Center)
Do Han Kim1, Hyo Seon Suh2,3, Priya Moni1, Shisheng Xiong2,3, Leonidas C. Ocola4, Paul F. Nealey2,3 and Karen K. Gleason5, (1)Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA, (2)Institute for Molecular Engineering, University of Chicago, Chicago, IL, (3)Material Science Division, Argonne National Laboratory, Argonne, IL, (4)Center for Nanoscale Materials, Argonne National Laboratory, Argonne, IL, (5)Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, MA

In technique of initiated CVD (iCVD), monomer and initiator vapors flow into a vacuum chamber. The resistively heated hot filaments in the chamber break the initiator into free-radicals. Subsequently, polymeric film growth begins on cooled substrates through free-radical polymerization of monomer. We introduce iCVD films as an effective top-coat in directed self-assembly (chemoexpitaxy) to create scalable sub-10 nm patterns. One of the benefits of vapor deposition is the ability to form smooth and pinhole-free ultrathin films. The iCVD layers, <10 nm thick, were successfully deposited as a top-coat on block copolymers (BCPs). In combination with BCPs displaying strongly segmenting domains (high χ), the iCVD top-coat enabled resolution of sub-10 nm patterns by directed self-assembly. This presentation will show and discuss on the concept of iCVD top-coat, sub-10 nm patterns driven by iCVD top-coat, and spectroscopic observations in comparison with a conventional solution-cast films applied by spin-coating.

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See more of this Session: Nanomaterials Manufacturing
See more of this Group/Topical: Nanoscale Science and Engineering Forum