28 Plasma Science and Gas Phase Deposition Techniques

Sunday, November 16, 2014: 3:30 PM
A706 (Marriott Marquis Atlanta)
Description:
This session will examine recent advances in the fundamental study and application of plasma processes and gas phase deposition techniques, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE), and related approaches. Both experimental and theoretical contributions to this session are encouraged.

Sponsor:
Electronics and Photonics

Chair:
Selma Mededovic
Email: smededov@clarkson.edu

Co-Chair:
Malancha Gupta
Email: malanchg@usc.edu

- indicates paper has an Extended Abstract file available on CD.


3:30 PM
(28a) Photo-Enhanced Atmospheric Plasma-Assisted Chemical Vapor Deposition: UV-Plasma Synergies Under Ambient Conditions
Brandon S. Curtis

3:50 PM
Break

4:15 PM
(28c) Analysis of OH Radical Scavengers to Assess Chemical Reactions in Electrical Discharge Plasma Formed at a Gas-Liquid Interface
Kevin Hsieh, Bruce R. Locke, Robert Wandell and Huijuan Wang
File available
4:35 PM
(28d) Modeling and Analysis of Rapid Synthesis of GaAs By Hydride Vapor Phase Epitaxy Process
Min Yao, James B. Rawlings, Kevin L. Schulte and Thomas F. Kuech

4:55 PM
(28e) Large-Scale Simulation of Plasma-Facing Materials for Tokamaks and Linear Devices
Karl D. Hammond, Lin Hu, Dimitrios Maroudas and Brian D. Wirth

5:15 PM
(28f) Transport and Reactions of Mobile Helium Clusters Near Surfaces and Grain Boundaries of Plasma-Exposed Tungsten
Lin Hu, Karl D. Hammond, Brian D. Wirth and Dimitrios Maroudas
See more of this Group/Topical: Materials Engineering and Sciences Division
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