398747 Design, Synthesis, and Characterization of an Aqueous Alkaline Developable Molecular Resist for Euv Lithography

Monday, November 17, 2014
Galleria Exhibit Hall (Hilton Atlanta)
Ashten L. Fralick1, Clifford L. Henderson2, Laren M. Tolbert3, Brandon L. Sharp1, Richard A. Lawson4 and Hannah L. Narcross1, (1)Chemistry, Georgia Institute of Technology, Atlanta, GA, (2)School of Chemical & Biomolecular Engineering, Georgia Institute of Technology, Atlanta, GA, (3)School of Chemistry and Biochemistry, Georgia Institute of Technology, Atlanta, GA, (4)School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, Atlanta, GA

Abstracts:


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