390669 Atmospheric Plasma-Assisted Chemical Vapor Deposition

Monday, November 17, 2014
Galleria Exhibit Hall (Hilton Atlanta)
Brandon S. Curtis, Chemical and Biomolecular Engineering, UC Berkeley, Berkeley, CA

Recent work has sought to adapt plasma-assisted CVD and functionalization to ambient conditions with atmospheric non-thermal plasma discharge systems, for the in situ treatment of surfaces that are not amenable to processing under typical vacuum chamber CVD conditions.  We present work on the design of low-cost systems—power supplies, gas and precursor feeds, and real-time analysis hardware—for the deposition of ultrathin, chemically-functionalized polymer films on heat-labile surfaces at atmospheric pressure.

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