384117 Pore-Size Tuning of Plasma-Deposited Organosilica Membranes for Gas Separation

Tuesday, November 18, 2014
Galleria Exhibit Hall (Hilton Atlanta)
Hiroki Nagasawa, Toshihiro Minamizawa, Masakoto Kanezashi, Tomohisa Yoshioka and Toshinori Tsuru, Department of Chemical Engineering, Hiroshima University, Higashi-Hiroshima, Japan

Organosilica membranes for gas separation were prepared by plasma-enhanced chemical vapor deposition (PECVD) using hexamethyldisiloxane (HMDSO), trimethylmethoxysilane (TMMS), and methyltrimethoxysilane (MTMS) as the silicon precursor. The gas permeation measurement revealed that MTMS-derived membrane had the highest He/N2 selectivity, followed by the TMMS-derived and HMDSO-derived membranes. FT-IR characterization indicated that the HMDSO-derived membrane has the highest content of methyl group, while the methyl group content for the MTMS-derived membranes was the lowest. These results suggested that the pore size of organosilica membranes can be tuned by changing the chemical structure of the silicon precursor.

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See more of this Session: Poster Session: Membranes
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