377829 Activity and Productivity of Co ALD Catalysts for FTS

Wednesday, November 19, 2014: 3:55 PM
306 (Hilton Atlanta)
Staci A. Van Norman, Caitlin E. Majlinger, John L. Falconer and Alan W. Weimer, Chemical and Biological Engineering, University of Colorado at Boulder, Boulder, CO

Significant advancement of FTS could allow for industrialization of GTL at a capacity having a considerable impact on the energy economy.  The gas phase deposition technology of Atomic layer deposition (ALD) is a thin film technology analogous to chemical vapor deposition.  Metallic Co ALD was utilized for a new type of highly-productive catalyst and reactor for valuable fuel products.  Avoiding reduction of Co3O4 to metallic Co eliminates processing temperatures above reaction temperature; this reduces the likelihood of sintering Co catalyst particles, and lowering productivity.  Product selectivity, conversion and productivity have been demonstrated for low weight loading Co catalysts having 5-11 wt% Co.

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See more of this Session: Syngas Production and Gas-to-Liquids Technology
See more of this Group/Topical: Catalysis and Reaction Engineering Division