377346 Current Leakage Relaxation and Charge Trapping in Dielectric Materials

Monday, November 17, 2014: 12:30 PM
Crystal Ballroom C/D (Hilton Atlanta)
Joel L. Plawsky, Chemical, Rensselaer Polytechnic Institute, Troy, NY, Juan Borja, Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, NY, Toh-Ming LU, RPI, Troy, NY and Hassaram Bakhru, CNSE, Albany, NY

Abstracts:


Extended Abstract: File Not Uploaded
See more of this Session: Physical Properties for Chemical Product Design
See more of this Group/Topical: Process Development Division