697 Plasma Science and Technology

Thursday, November 7, 2013: 12:30 PM
Union Square 23 (Hilton)
Description:
Plasmas can be formed in vacuum, in gases, or in liquids, and are widely utilized in a variety of industries for the deposition and etching of thin films. This session will examine advances in the fundamental study and application of plasmas for electronic materials processing.

Sponsor:
Electronics and Photonics

Chair:
Selma Mededovic
Email: smededov@clarkson.edu

- indicates paper has an Extended Abstract file available on CD.


12:30 PM
(697a) The Applications of Thermodynamic Approach to Select Viable Chemistry in Plasma Etching
Kun-Chieh Jack, Taeseung Kim, Vladan Jankovic and Jane P. Chang

12:55 PM
(697b) Photochemical Interaction Between Air Plasma Reactive Species and UV Photons
Matthew J. Pavlovich, David B. Graves and Douglas S. Clark
File available
1:20 PM
See more of this Group/Topical: Materials Engineering and Sciences Division