697 Plasma Science and Technology
697 Plasma Science and Technology
Thursday, November 7, 2013: 12:30 PM
Union Square 23 (Hilton)
Description:
Plasmas can be formed in vacuum, in gases, or in liquids, and are widely utilized in a variety of industries for the deposition and etching of thin films. This session will examine advances in the fundamental study and application of plasmas for electronic materials processing.
Sponsor:
Electronics and Photonics
Chair:

See more of this Group/Topical: Materials Engineering and Sciences Division