Chemical Reactor Modeling: Yesterday, Today, and Tomorrow

The talk will attempt to trace Prof. Klavs Jensen and his team’s legacy on bringing concepts to reactor modeling to practical applications.  We will touch upon their work in Low Pressure multi-wafer Chemical Vapor Deposition,  Plasma etching, Multi-scale techniques, Rapid Thermal Processing, and Micro reactors.  We illustrate how these applications were used to drive some of the technology applications for the community at large and specifically in semiconductor companies.