755 Gas Phase Deposition and Interfacial Phenomena

Thursday, November 1, 2012: 3:15 PM
Fayette (Westin )
Description:
Gas phase deposition includes a wide variety of thin film growth technologies, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE), as well as several other methods included within these broad topics.

Sponsor:
Electronics and Photonics

Chair:
Malancha Gupta
Email: malanchg@usc.edu

Co-Chair:
Xinhua Liang
Email: liangxin@mst.edu


3:15 PM
(755a) Systematic Tuning of Cross-Linking in Vapor-Deposited Polymer Thin Films
Christy D. Petruczok, Rong Yang and Karen K. Gleason

3:38 PM
(755b) Vapor Phase Polymerization Onto Liquid Surfaces
Laura Bradley and Malancha Gupta

4:01 PM
(755c) Passively Controlled Thermal Material Deposited by Atomic Layer Deposition
Vivek Dwivedi, Raymond A. Adomaitis and Curtisha D. Travis

4:24 PM
Break

4:36 PM
(755d) Manufacturing of Nanostructured Particles Using Atmospheric-Pressure ALD
J. Ruud van Ommen

4:59 PM
(755e) Atomic Layer Deposition of the Quaternary Chalcogenide Cu2ZnSnS4 (CZTS)
Elijah Thimsen, Shannon Riha, Alex Martinson, Jeffrey Elam and Michael J. Pellin

5:22 PM
(755f) Energy Levels, Electronic Properties, and Rectification in Ultrathin P-NiO Films Synthesized by Atomic Layer Deposition
Elijah Thimsen, Alex Martinson, Jeffrey Elam and Michael J. Pellin
See more of this Group/Topical: Materials Engineering and Sciences Division
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