369 Plasma Science and Technology

Tuesday, October 30, 2012: 3:15 PM
Cambria East (Westin )
Description:
A plasma is a state of matter similar to gas in which a certain portion of the particles are ionized. Plasmas can be formed in vacuum, in gases, or in liquids, and are widely utilized in a variety of industries for the deposition and etching of thin films. This session will examine advances in the fundamental study and application of plasmas.

Sponsor:
Electronics and Photonics

Chair:
Selma Mededovic
Email: smededov@clarkson.edu

- indicates paper has an Extended Abstract file available on CD.

File available
3:15 PM
(369a) Pulsed Laser Ablation in near-Critical Carbon Dioxide for Nanoparticle Fabrication
Motonobu Goto, Siti Machmudah and Wahyu Diono

3:40 PM
(369b) Plasma-Induced Evolution of Surfaces
Karl D. Hammond, Faiza Sefta and Brian D. Wirth

4:05 PM
(369c) Mathematical Modeling of Electrical Discharges in Liquid Water: The Chemistry Inside the Plasma Channel
Joshua Franclemont and Selma Mededovic

4:30 PM
(369d) Predictions of the Etch Behavior of Complex Oxide Films for High-k and Multiferroic Applications
Nathan P. Marchack, Jack Chen and Jane P. Chang
See more of this Group/Topical: Materials Engineering and Sciences Division
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