292076 Particle Deposition and Potential Resuspension Studies Inside Microchannels by Reflection Interference Contrast Microscopy

Tuesday, October 30, 2012
Hall B (Convention Center )
Jose C. Contreras-Naranjo and Victor M. Ugaz, Artie McFerrin Department of Chemical Engineering, Texas A&M University, College Station, TX

Different deposition scenarios are expected when micron-size particles are deposited on a surface depending upon environmental conditions (relative humidity, temperature), deposition medium (air, liquid), and time effects. For instance, when using a liquid as deposition medium, a liquid meniscus can form between the particles and the substrate at the end of the drying process; depending on the conditions, the meniscus can dry out completely or partially, and the particles might undergo deformation due to capillary forces, in addition to regular adhesion forces, creating a variety of deposition scenarios. Reflection Interference Contrast Microscopy (RICM) offers a unique and convenient view of the deposition phenomenon as the minimum separation distance between particle and substrate, contact area, and particle contour can be accurately quantified when looking at the sample from below using monochromatic light. For particles deposited inside a properly setup microfluidic chamber, experiments can be performed to study the effect of an increasing shear rate that eventually produces unbinding of particles adhered onto the substrate under controlled conditions.

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