284156 Micron-Size Particle Deposition Scenarios by Reflection Interference Contrast Microscopy

Monday, October 29, 2012
Hall B (Convention Center )
Jose C. Contreras-Naranjo and Victor M. Ugaz, Artie McFerrin Department of Chemical Engineering, Texas A&M University, College Station, TX

Different deposition scenarios are expected when micron-size particles are deposited on a surface depending upon environmental conditions (relative humidity, temperature), deposition medium (air, liquid), and time effects. For instance, when using a liquid as deposition medium, a liquid meniscus can form between the particles and the substrate at the end of the drying process; depending on the conditions, the meniscus can dry out completely or partially, and the particles might undergo deformation due to capillary forces, in addition to regular adhesion forces, creating a variety of deposition scenarios. Reflection Interference Contrast Microscopy (RICM) offers a unique and convenient view of the deposition phenomenon as the minimum separation distance between particle and substrate, contact area, and particle contour can be accurately quantified when looking at the sample from below using monochromatic light. This information collected from hundreds of individual particles is used to describe the microscopic effects of the aforementioned variables on particle deposition which represents valuable information for resuspension and adhesion models.

Extended Abstract: File Not Uploaded
See more of this Session: Interfacial Phenomena (Area 1c) Poster Session
See more of this Group/Topical: Engineering Sciences and Fundamentals