Start | Grid View | Browse by Day OR Group/Topical | Author Index | Keyword Index | Personal Scheduler

Gas Phase Deposition

Wednesday, October 19, 2011: 12:30 PM
L100 G (Minneapolis Convention Center)

Description:
Gas phase deposition includes a wide variety of thin film growth technologies, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and molecular beam epitaxy (MBE), as well as several other methods included within these broad topics.


Sponsor:
Electronics and Photonics


Chair:
Malancha Gupta
Email: malanchg@usc.edu

Co-Chair:
Mark T. Swihart
Email: swihart@eng.buffalo.edu



12:30 PM
(530a) Physical Vapor Transport of Aluminum Nitride On Silicon Carbide Substrates: Parameters Affecting Nucleation
J. H. Edgar and Li Du


12:55 PM
(530b) Hot Wire Assisted Chemical Vapor Deposition (HWCVD) of Niobium Nitride Thin Films
Alejandro Martínez, Daniel F. Jaramillo and Pablo Ortiz


1:20 PM
(530c) Effect of Process Variables On Microestructure and Composition of HWCVD Tungsten Oxides Thin Films
Daniel F. Jaramillo, Alejandro Martínez, Ana M. Araujo and Pablo Ortiz


1:45 PM
(530d) High-Pressure Chemical Deposition of Silicon In Extreme Aspect-Ratio Micro-Capillaries
Banafsheh Keshavarzi, Neil Baril, John V. Badding and Ali Borhan


2:10 PM
(530e) Initiated Chemical Vapor Deposition of Polymer Thin Films for Photolithography Applications
Christy D. Petruczok and Karen K. Gleason
See more of this Group/Topical: Materials Engineering and Sciences Division
<< Previous Session | Next Session >>