Session: Plasma Science and Technology (2011 Annual Meeting)

Monday, October 17, 2011: 8:30 AM

M100 G (Minneapolis Convention Center)

Description:

In physics and chemistry, plasma is a state of matter similar to gas in which a certain portion of the particles are ionized. Plasmas can be formed in vacuum, in gases, or in liquids. Plasmas are widely utilized in a wide variety of industries for deposition and etching of thin films.

Sponsor:

Electronics and Photonics

Chair:

Jane P. Chang
Email: jpchang@seas.ucla.edu

Co-Chair:

Selma Mededovic
Email: smededov@clarkson.edu

8:30 AM

(45a) Atmospheric Pressure Plasma Effects On the Composition and Adhesive Bonding Properties of Titanium and Titanium Alloy
Edward W. Harris, Justin Massey, Thomas Williams, S. F. (Dick) Cheng and Robert F. Hicks

8:55 AM

(45b) Engineering Antimicrobial Skin: In Situ Tissue Functionalization Using Atmospheric Pressure Plasmas
Matthew J. Pavlovich, Yukinori Sakiyama, Douglas S. Clark and David B. Graves

9:20 AM

(45c) High Efficiency Chemical Synthesis Using Pulsed Plasma Gliding Arc Reactors with Water Spray
Bruce R. Locke, Kevin Hsieh, Robert Wandell, Wright Finney and Radu Burlica

9:45 AM

(45d) Coupling of Surface Mixed-Layer Kinetics and Monte Carlo Modeling for Profile Evolution In Patterning Complex Oxides
Nathan P. Marchack, Calvin Pham and Jane P. Chang

10:10 AM

(45e) Multiphysics Modeling of Ambient Gas Plasma-Based Wound Healing Process
Yukinori Sakiyama, Marat Orazov and David Graves

10:35 AM

(45f) Combinatorial Chemistries for Reducing Protein Adhesion with Plasma Grafting
Minghao Gu, Arturo Vegas, James Kilduff, Daniel G. Anderson, Robert Langer and Georges Belfort

11:00 AM

(45g) High Performance Thin Film Based Coatings In Aircraft Applications
Marvi A. Matos

See more of this Group/Topical: Materials Engineering and Sciences Division

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