Atomic Layer Deposition As a Catalyst Synthesis Technique for Nickel Nanoparticles

Tuesday, October 18, 2011: 3:55 PM
M100 J (Minneapolis Convention Center)
Troy D. Gould1, John L. Falconer2, J. Will Medlin3 and Alan W. Weimer2, (1)Chemical and Biological Engineering, University of Colorado at Boulder, Boulder, CO, (2)Chemical & Biological Engineering, University of Colorado at Boulder, Boulder, CO, (3)Department of Chemical and Biological Engineering, College of Engineering and Applied Science, University of Colorado-Boulder, Colorado Center for Biorefining and Biofuels, Boulder, CO

Efforts to design new catalysts for renewable energy applications have revolved around increasing selectivity & activity by exploring advantages of catalysis at the nanoscale, mainly due to geometric & electronic effects.  This work investigates the synthesis of Ni nanoparticle catalysts through the scalable gas phase synthesis route of Atomic Layer Deposition (ALD).  Typically ALD deposits Ni as a NiO film, however; Ni nanoparticles were synthesized by using elevated reaction temperatures to produce particles with diameters <5nm.  Smaller particles were created to have more catalytically active defects on the surface of the particles.  The catalysts were characterized via Temperature Programed Reduction (TPR), chemisorption, Transmission Electron Microscopy (TEM), & Inductively Coupled Plasmon Mass Spectroscopy (ICP-MS) & compared to traditional incipient wetness Ni catalysts.  The incipient wetness Ni catalysts were also used as a base comparison of catalytic activity for alkene hydrogenolysis reactions.  We will also present the investigations of the controlled preparation of bimetallic catalysts using ALD.

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See more of this Session: Functional Nanoparticles and Nanocoatings on Particles I
See more of this Group/Topical: Particle Technology Forum