Kinetics of Dry Neutralization of Dodecyl-Benzenesulfonic Acid with Respect to Detergent Granulation

Monday, October 17, 2011: 2:15 PM
M100 F (Minneapolis Convention Center)
Marek Schongut1, Zdenek Grof2 and Frantisek Stepanek1, (1)Department of Chemical Engineering, Institute of Chemical Technology, Prague, Prague, Czech Republic, (2)Department of Chemical Engineering, Institute of Chemical Technology, Prague, Prague 6, Czech Republic

Sodium dodecyl-benzensulfonate (NaLAS) is one of the most common anionic surfactant that is being used in powder detergents. It is a product of dry neutralization, which is a chemical reaction where one of the reagents (in this case the base, sodium carbonate) is in the solid state. Dry neutralization usually takes place in a reactive granulator where drops of dodecyl-benzensulfonic acid (HLAS) are mixed with primary particles of sodium carbonate to form the final granules. The acid therefore acts not only as a reactant but also as a particle binder, and the particle wetting and simultaneous chemical reaction influence each other. In this work the reaction and wetting kinetics of dry neutralization are being investigated with a macroscopic method of observing the behavior of a HLAS drop on a substrate pellet made from sodium carbonate. The reaction rate at different temperatures was evaluated from the increasing volume of the drop with rising amount of carbon dioxide bubbles that are a side product of dry neutralization. Wetting kinetics is represented as a relationship between the velocity of a three-phase contact line and dynamic contact angle. From experiments carried out to date, it seems that the chemical reaction rate is limited by a passivation layer made from liquid crystals of NaLAS and water. The relevant kinetic parameters (reaction rate constant and apparent diffusion coefficients) have been evaluated using a numerical model of coupled reaction and diffusion processes in the passivation layer.

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See more of this Session: Agglomeration and Granulation Processes
See more of this Group/Topical: Particle Technology Forum