Session: Plasma Science and Processing (2009 Annual Meeting)

Plasma Science and Processing

Wednesday, November 11, 2009: 8:30 AM

Magnolia Boardroom B (Gaylord Opryland Hotel)

Description:

This session focuses on plasma science and processing topics, including gas-phase diagnostics, plasma-surface interactions, and multiscale modeling.

Sponsor:

Electronics and Photonics

Chair:

Sang M. Han
Email: meister@unm.edu

Co-Chair:

Cheng-che (Jerry) Hsu
Email: chsu@ntu.edu.tw

8:30 AM

(378a) Mechanism for Surface Activation of Aromatic Polymers with Atmospheric Pressure Plasmas
Eleazar Gonzalez II, Michael Barankin, Peter C. Guschl and Robert F. Hicks

8:55 AM

(378b) Sterilization of Surfaces with a Handheld Atmospheric Pressure Plasma
Sara B. Habib, Eleazar Gonzalez II, A. Tijerina, Mark Sloan and R. F. Hicks

9:20 AM

(378c) Plasma-Assisted Atomic Layer Deposition of Titanium Dioxide: Reaction Mechanism Studies Using Attenuated Total Reflection Fourier Transform Infrared Spectroscopy
Vikrant R. Rai and Sumit Agarwal

9:45 AM

(378d) Diagnostic Study of An Arc Plasma Jet Under Atmospheric Pressure and Its Applications to Materials Processing
Cheng-che (Jerry) Hsu, Chengyi Wu, Yaowen Hsu and Yaojhen Yang

10:10 AM

(378e) First-Principles-Based Kinetic Modeling of Surface Growth During Plasma Deposition of Silicon Thin Films
Sumeet C. Pandey, Tejinder Singh and Dimitrios Maroudas

10:35 AM

(378f) Feature Profile Evolution: From Plasma Etching and Deposition to Surface Roughness Propagation
John Hoang and Jane P. Chang

See more of this Group/Topical: Materials Engineering and Sciences Division