Session: Gas-Phase Deposition of Thin Films (2009 Annual Meeting)

Monday, November 9, 2009: 12:30 PM

Magnolia Boardroom B (Gaylord Opryland Hotel)

Description:

This session calls for papers related to gas-phase deposition of thin films, including but not limited to physical vapor deposition, chemical vapor deposition, molecular beam epitaxy, and atomic layer deposition.

Sponsor:

Electronics and Photonics

Chair:

John G. Ekerdt
Email: ekerdt@che.utexas.edu

Co-Chair:

W. Robert Ashurst
Email: ashurwr@eng.auburn.edu

12:30 PM

(92a) GaAs Integration On High-Quality Ge On Si for Multijunction Solar Cells
Darin Leonhardt, Josephine Sheng, Jeffrey Cederberg, Malcolm Carroll and Sang M. Han

12:55 PM

(92b) Integration of iCVD Polymer Electrolytes in Quasi Solid State Dye Sensitized Solar Cells
Siamak Nejati and Kenneth K.S. Lau

1:20 PM

(92c) Chemical Vapor Deposition of WN_xC_y for Diffusion Barrier Application Using a Tungsten Diphenylhydrazido Complex
Dojun Kim, Oh Hyun Kim, Tim Anderson, Jürgen Koller, Lisa McElwee-White, Lii-Cherng Leu and David P. Norton

1:45 PM

(92d) Predicting and Controlling Self-Assembly in Al(110) Homoepitaxial Growth
Yogesh Tiwary and Kristen A. Fichthorn

2:10 PM

(92e) Chemical Vapor Deposition Reactor Design for Copper Oxide Films Used in Photoelectrochemical Hydrogen Production Applications
Glenn Guglietta and Raymond A. Adomaitis

2:35 PM

(92f) Dispersed Nanoelectrodes Devices
Antonio Tricoli and Sotiris E. Pratsinis

See more of this Group/Topical: Materials Engineering and Sciences Division