Gold Island Film Patterning Via Selective Electroless Plating On Vapor-Deposited Silane Monolayers

Wednesday, November 11, 2009
Ryman Hall B1/B2 (Gaylord Opryland Hotel)

Wonmi Ahn, Materials Science and Engineering, University of Utah, Salt Lake City, UT
D. Keith Roper, Ralph E Martin Department of Chemical Engineering, University of Arkansas, Fayetteville, AR

Micro/nano-patterned surfaces are important in opto-electronic and plasmonic devices, in biomedical materials and in bio- or chemical-sensor applications to improve their sensitivity and specificity to, for example, bio- or hazardous gas molecules. Here, we present various gold (Au) island film patterns on quartz substrates using nanosphere masks that serve as a negative mask for selective electroless (EL) Au plating after vapor-deposition of silane monolayers. We evaluate effects of surface hydration on the quality of silanization and Au island film patterns by changing conditions of (i) substrate hydroxylation, (ii) substrate dehydration by pre- and post-drying, and (iii) beads lifting-off bath. We show structural regularity of the Au island film patterns by scanning electron microscope images and analyze spectral features of them using a spectrometer. This method is applicable to the fine fabrication of metal platforms for improved optical and plasmonic features in sensing and imaging devices.
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