Photoresist Derived Carbon as a SubstratumFor Nerve Cell Culture

Wednesday, November 11, 2009
Ryman Hall B1/B2 (Gaylord Opryland Hotel)

Ahsan Munir, Worcester Polytechnic Institute, Worcester, MA
H. Susan Zhou, Worcester Polytechnic Institute, Worcester, MA
Richard Pampuro, Worcester Polytechnic Institute, Worcester, MA
Chunwei Kuo, Department of Chemical Engineering , Worcester Polytechnic Institute, Worcester, MA

Photoresist derived carbon films offer a unique set of properties that may be applied as substratum for neuron cell growth. At this early stage in realizing photoresist derived carbon's potential as a platform for neuron culture, it is necessary to examine surface properties and neuronal cell behavior on this unique substratum. Surfaces are characterized by means relevant for studying cell-surface response, including electrochemistry and surface energy. Comparing gene expression levels, adhesion and morphology of PC12 cells grown on photoresist derived carbon to that of alternative materials seeks to elucidate cell-surface interactions in context of known surface properties
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