Tuesday, November 18, 2008: 8:30 AM-11:00 AM
401/402 (Marriott Philadelphia Downtown)

Electronics and Photonics (08e)

#204 - Atomic Layer Deposition (08E07)
Atomic Layer Deposition This oral presenter session welcomes papers from a broad range of topics related to ALD including: equipment design, new precursor chemistries, new materials, new applications, and computational and experimental studies of chemical mechanisms and reaction pathways associated with ALD.
Chair:Brian G. Willis
CoChair:Charles Musgrave
8:30 AMMolecular Layer Deposition of Nanoscale Organic Films
Paul W. Loscutoff, Stacey F. Bent
8:55 AMAld Copper-Palladium Thin Films for Molecular Electronics
Irene Hsu, Brian G. Willis
9:20 AMLanthanum Stabilization of Ald-Grown Hafnia
John G. Ekerdt, Tuo Wang
9:45 AMAtomic Layer Deposited Y2O3 Thin Films Using Novel Cyclopentadienyl-Type Yttrium Precursor
Christos G. Takoudis
10:10 AMSurface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetraisopropoxide and Ozone
Sumit Agarwal, Vikrant R. Rai
10:35 AMEffect of Yb3+ Co-Doping on the Luminescent Properties of Er3+ :Y2O3 Thin Films
John Hoang, Jane P. Chang

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