Tuesday, November 18, 2008: 8:30 AM-11:00 AM
401/402 (Marriott Philadelphia Downtown)
Electronics and Photonics (08e)
#204 - Atomic Layer Deposition (08E07)
Atomic Layer Deposition This oral presenter session welcomes papers from a broad range of topics related to ALD including: equipment design, new precursor chemistries, new materials, new applications, and computational and experimental studies of chemical mechanisms and reaction pathways associated with ALD.
Chair:	Brian G. Willis
CoChair:	Charles Musgrave
8:30 AM	204a		Molecular Layer Deposition of Nanoscale Organic Films Paul W. Loscutoff, Stacey F. Bent
8:55 AM	204b		Ald Copper-Palladium Thin Films for Molecular Electronics Irene Hsu, Brian G. Willis
9:20 AM	204c		Lanthanum Stabilization of Ald-Grown Hafnia John G. Ekerdt, Tuo Wang
9:45 AM	204d		Atomic Layer Deposited Y2O3 Thin Films Using Novel Cyclopentadienyl-Type Yttrium Precursor Christos G. Takoudis
10:10 AM	204e		Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetraisopropoxide and Ozone Sumit Agarwal, Vikrant R. Rai
10:35 AM	204f		Effect of Yb3+ Co-Doping on the Luminescent Properties of Er3+ :Y2O3 Thin Films John Hoang, Jane P. Chang

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