Tuesday, November 18, 2008: 12:30 PM-3:00 PM
401/402 (Marriott Philadelphia Downtown)

Electronics and Photonics (08e)

#310 - Plasma Processing and Emerging Applications (08E03)
Plasma Processing
Chair:Sumit Agarwal
CoChair:Jane P. Chang
12:30 PMCompositional Tuning of Bimetallic Nanoparticles for Low Temperature Carbon Nanotube Growth
Wei-Hung Chiang, R. Mohan Sankaran
12:48 PMDesign of a High Throughput Microwave Plasma Reactor for Bulk Production of Metal Oxide Nanowires
Jeong H. Kim, Vivekanand Kumar, Mahendra K. Sunkara
1:06 PMModeling Plasma-Surface Interactions and Their Role In Inducing Structural Transitions In Materials
Dimitrios Maroudas
1:24 PM3-Dimensional Monte Carlo Profile Simulation and Experimental Measurements of Surface Roughness Under Plasma Etching
Wei Guo, Hiroyo Kawai, Herbert H. Sawin
1:42 PMSimulation of Profile Evolution In Shallow Trench Formation by Plasma Etching
John Hoang, Jane P. Chang
2:00 PMMolecular Dynamics Simulations of Plasma-Surface Interactions: Nanoscale Feature Etching on a Silicon Substrate
Joseph J. Végh, David B. Graves
2:18 PMStochastic Differential Charging and Its Effects on Charging Damage and Feature Profile Evolution during Plasma Processing
Eunsu Paek, Gyeong S. Hwang
2:36 PMCoupling Gas Phase and Surface Reaction Kinetics In C4F8 and SF6 Plasmas Used for Si and SiO2 Etching
George Kokkoris, Evangelos Gogolides, Andy Goodyear, Mike Cooke

See more of Materials Engineering and Sciences Division

See more of The 2008 Annual Meeting