Tuesday, November 18, 2008: 12:30 PM-3:00 PM | |||
401/402 (Marriott Philadelphia Downtown) | |||
Electronics and Photonics (08e) | |||
#310 - Plasma Processing and Emerging Applications (08E03) | |||
Plasma Processing | |||
Chair: | Sumit Agarwal | ||
CoChair: | Jane P. Chang | ||
12:30 PM | 310a | Compositional Tuning of Bimetallic Nanoparticles for Low Temperature Carbon Nanotube Growth Wei-Hung Chiang, R. Mohan Sankaran | |
12:48 PM | 310b | Design of a High Throughput Microwave Plasma Reactor for Bulk Production of Metal Oxide Nanowires Jeong H. Kim, Vivekanand Kumar, Mahendra K. Sunkara | |
1:06 PM | 310c | Modeling Plasma-Surface Interactions and Their Role In Inducing Structural Transitions In Materials Dimitrios Maroudas | |
1:24 PM | 310d | 3-Dimensional Monte Carlo Profile Simulation and Experimental Measurements of Surface Roughness Under Plasma Etching Wei Guo, Hiroyo Kawai, Herbert H. Sawin | |
1:42 PM | 310e | Simulation of Profile Evolution In Shallow Trench Formation by Plasma Etching John Hoang, Jane P. Chang | |
2:00 PM | 310f | Molecular Dynamics Simulations of Plasma-Surface Interactions: Nanoscale Feature Etching on a Silicon Substrate Joseph J. Végh, David B. Graves | |
2:18 PM | 310g | Stochastic Differential Charging and Its Effects on Charging Damage and Feature Profile Evolution during Plasma Processing Eunsu Paek, Gyeong S. Hwang | |
2:36 PM | 310h | Coupling Gas Phase and Surface Reaction Kinetics In C4F8 and SF6 Plasmas Used for Si and SiO2 Etching George Kokkoris, Evangelos Gogolides, Andy Goodyear, Mike Cooke |
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