| Tuesday, November 18, 2008: 3:15 PM-5:45 PM | |||
| Room 202-B (Pennsylvania Convention Center) | |||
Electronics and Photonics (08e) | |||
| #370 - Plasma-Assisted and Thermal Chemical Vapor Deposition (08E01) | |||
| Deposition of thin films using thermal decomposition of metal-organic and organometallic precursors. Characterization of films deposited from CVD. | |||
| Chair: | Sang M. Han | ||
| CoChair: | John G. Ekerdt | ||
| 3:15 PM | 370a | An Analysis of the Deposition Mechanisms Involved during Self-Limiting Growth of Metal Oxides by Pulsed PECVD Michael T. Seman, David N. Richards, Colin A. Wolden | |
| 3:35 PM | 370b | Kinetic Monte Carlo Simulations of Surface Growth during Plasma Deposition of Silicon Thin Films Sumeet C. Pandey, Tejinder Singh, Dimitrios Maroudas | |
| 3:55 PM | 370c | Investigation of the Growth Mechanism during Plasma-Assisted Deposition of a-C:H Bhavin N. Jariwala, Cristian V. Ciobanu, Sumit Agarwal | |
| 4:15 PM | 370d | Remote Atmospheric Pressure Plasma Activation of Polymers Eleazar Gonzalez II, Michael Barankin, Peter C. Guschl, Robert F. Hicks | |
| 4:35 PM | 370e | Thin-Film Deposition on Nanoparticles and Nanowires In Low-Pressure Plasma Anaram Shahravan, Themis Matsoukas | |
| 4:55 PM | 370f | Multiferroic BiFeO3 Thin Films Deposited by MOCVD Method Manish Singh, Yi Yang, Christos G. Takoudis | |
| 5:15 PM | 370g | Interesting Characteristics of a Vapor-Deposited Silica Thin Film A. Anderson, W. Robert Ashurst | |
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