In this talk we present results of film deposition on silica particles and on nanowires of various sizes in a plasma reactor in parallel-plate configuration driven by RF generator. Particles are introduced into the reactor via hollow stem of the top electrode and they become trapped in the sheath, a few mm above the bottom electrode. Vertical confinement is accomplished by force balance between the weight of the particles, and electrostatic repulsion from the electrode. Horizontal confinement is achieved by introducing asymmetry between the top and bottom electrodes. Various organic gases and vapors are introduced in the plasma and supply the coating material. Under the influence of the plasma, these organic molecules fragment and produce amorphous hydrogenated carbon (a-C:H) which is deposited on the surface of the suspended particles. Monodisperse silica particles of various sizes are studied for their ability to remain confined and to receive uniform deposition. We find that the thickness of the films is a linear function of time and is of the order of a few nanometers per minute. Analysis of the distribution of the deposited films further suggests that the sheath region where trapping occurs is an inhomogeneous environment that exhibits a wide, quasi exponential distribution of deposition rates. While the majority of particles appear to be trapped in regions of low deposition, substantially higher deposition rates are also observed. We discuss the implications of these findings on the feasibility of converting this semi-batch coating process into one that is continuous.