- 9:40 AM
56c
Overcoming Patterning Challenges at the 32 Nm Nodes
Arpan Mahorowala
, IBM, Yorktown Heights, NY 10504
Overcoming Patterning Challenges at the 32 nm Nodes
See more of
#56 - Topics in Plasma Science and Thin Film Applications I - in Honor of Herbert H. Sawin (08E02)
See more of
Materials Engineering and Sciences Division
See more of
The 2008 Annual Meeting