Han Sang Oh1, Dae-Jin Kim1, Myung-Jun Park2, Moon-Kyu Yoon3, Moonyong Lee3, and Kee-Kahb Koo1. (1) Department of Chemical and Biomolecular Engineering and Interdisciplinary Program of Integrated Biotechnology, Sogang University, Seoul, 121-742, Korea, (2) Korex Co., Anyang, 431-804, South Korea, (3) School of Chemical Engineering and Technology, Yeungnam University, Kyongsan, 712-749, South Korea
Photoresist strippers used to remove the residue of photoresist in the TFT-LCD or semiconductor process are organic solvent mixtures with some additives. In the present experiments, main organic solvents including NMP and BDG were reclaimed from waste photoresist stripper by using a spinning band distillation column. Purity of final products were obtained to be 99.5%, water content less than 0.05% and most metal contents less than 10ppb, respectively. To extend those experiments further, a computer simulation for a continuous distillation process was made using NRTL and Peng-Robinson equations.