Wednesday, November 15, 2006: 3:15 PM-5:45 PM
Union Square 5 & 6 (Hilton San Francisco)
#449 - Interfacial Phenomena in Conducting and Semiconducting Systems (01C15)
The session welcomes both experimental and theoretical work concerning all aspects of electronic manufacturing where interfacial phenomena play an enabling role. The general areas of interest (but not limited) are cleaning, chemical mechanical polishing (CMP), metrology, lithography, surface modification, chemical vapor deposition (CVD). Both fundamental and applied works are highly encouraged.
Chair:Sekhar Sundaram
CoChair:Van N. Truskett
3:15 PMElectrochemistry of Active Metals in Aqueous Hf
Ian I. Suni, Bing Du
3:40 PMInterfacial Phenomena in Copper Galvanic Displacement Onto Silicon
Calvin P. daRosa, Enrique Iglesia, Roya Maboudian
4:05 PMThe Electronic Structure of Metals on High-K Dielectrics; Metal Induced Gap States for the Ru and Ruo2 on Hfo2 Interfaces
Atashi Mukhopadhyay, Javier Fdez. Sanz, Charles B. Musgrave
4:30 PMNon-Lithographic Microetching of Transparent Conductive Oxides (Ito and Zno) and Semiconductors (Gaas) Based on Reaction-Diffusion
Stoyan K. Smoukov, Bartosz A. Grzybowski
4:55 PMSynthesis of Stabilized Nanoparticles of Varying Composition and Aspect Ratio for Extrinsic Conducting Polymer
Ramya Vedaiyan, Arvind Vyas Harinath, Chandra Banerjee, Jag Sankar, Jianzhong Lou
5:20 PMSurface Chemistry of Cdse: Implications for Nanocrystalline Growth
Jane Y. Rempel, Bernhardt L. Trout, Moungi G. Bawendi, Klavs F. Jensen

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