Wednesday, November 15, 2006: 12:30 PM-3:00 PM
Union Square 25 (Hilton San Francisco)
#398 - Molecular Modeling in Electronic Materials Processing (21003)
This session will address problems arising in electronic materials processing using molecular modeling tools such as quantum mechanical density functional theory calculations, molecular-dynamics simulations, and kinetic Monte Carlo simulations. Materials systems of interest include bulk, thin-film, and nanonstructured forms of crystalline and amorphous semiconductors, conductors, and insulators, which are used in various microelectronic, optoelectronic, and photovoltaic technologies.
Chair:Dimitrios Maroudas
CoChair:Talid R. Sinno
12:30 PMMechanisms for Interstitial-Mediated Transient Enhanced Diffusion of Arsenic and Phosphorus Dopants
Scott A. Harrison, Thomas F. Edgar, Gyeong S. Hwang
12:55 PMAn Investigation into Gallium Arsenide Thin Film Growth: Molecular Dynamics Simulation
Maria H. Mignogna, Kristen A. Fichthorn, Thomas Hammerschmidt, Peter Kratzer, Matthias Scheffler
1:20 PMAb Initio Simulations of Surface Chemistry for Thin Film Growth of Electronic Materials
Charles B. Musgrave
1:45 PMA Computational Microscopy Study of Self-Interstitial Aggregation in Ion-Irradiated Silicon
Sumeet Kapur, Talid R. Sinno
2:10 PMAnalysis of Misfit Dislocation Formation and Strain Relaxation in Si1-XGeX Thin Films on Si (100) Substrates
Kedarnath Kolluri, Dimitrios Maroudas
2:35 PMKinetic Monte Carlo Simulations of Void Morphological Evolution in Silicon in the Presence of Oxygen
Jianguo Dai, Warren D. Seider, Talid R. Sinno

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