Tuesday, November 14, 2006: 3:15 PM-5:45 PM
Yerba Buena Ballroom 2 (Marriott San Francisco)
#298 - Polymer Thin Films and Interfaces III (08A03)
Block copolymer thin films provide the opportunity to design materials ideal for nanoscale applications based on their ability to self-assemble into periodic structures. This session focuses on the manipulation of thin film copolymer ordering using surfaces, electric fields, solvent annealing, topographical patterns, mechanical shearing, or other methods. Both experimental and theoretical works are welcome, and should highlight the characterization of thin film morphologies and provide useful insights into nanostructure formation.
Chair:Thomas H. Epps III
CoChair:Richard Elliott
3:15 PMIntroductory Remarks
3:20 PMInvestigation of Block Copolymer Behavior on Patterned
George J. Papakonstantopoulos, Kostas Daoulas, Francois Detcheverry, Marcus Muller, Paul F. Nealey, Juan J. De Pablo
3:40 PMSymmetry Breaking in Block Copolymer Thin Films
Eric Cochran, Gila E. Stein, Glenn H. Fredrickson, Edward Kramer
4:00 PMSelf Assembly of Rod-Coil Block Copolymers and Homopolymers
Yuefei Tao, Bradley D. Olsen, Rachel A. Segalman
4:20 PMSelf-Assembly of Double-Gyroid Phase Block Copolymer/Silica Thin Films
Hugh W. Hillhouse, Vikrant Urade, Michael Tate
4:40 PMBreak
4:45 PMSelectively Probing the Glass Transition Temperature in Block Copolymer Films
Connie B. Roth, John M. Torkelson
5:05 PMSelf-Assembly of Thin Polymer Film Via Electrohydrodynamic Instabilities
Ning Wu, Leonard F. Pease, William. B. Russel
5:25 PMEffects of Flow and Interfacial Block Copolymer on Polymer-Polymer Adhesion
Jianbin Zhang, Timothy P. Lodge, Christopher W. Macosko

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