Thursday, November 16, 2006: 3:15 PM-5:45 PM
Yerba Buena Ballroom 5 (Marriott San Francisco)
#607 - Plasma Processing I - Co-Sponsored by the American Vacuum Society (08E02)
Papers are solicited on the subject of low-temperature plasmas widely used in fabrication of integrated circuits, micro/nanoelectromechanical systems, and optoelectronic devices. This session will feature both modeling and experimental papers. Paper submission is encouraged in the areas of, but not limited to, plasma physics, gas phase and surface chemistry, kinetics and transport phenomena, plasma-surface interactions, diagnostics, process control, and other emerging areas of plasma science and engineering (e.g., flexible substrate electronics and photovoltaics, plasma treatment of biocompatible surfaces, environmentally benign plasma processing, and microdischarges).
Chair:Vincent M. Donnelly
CoChair:Sang M. Han
3:15 PMEffect of the Number of Pairs of Dielectric Barrier Discharge Reactor on Diesel Particulate Matter Removal and Pressure Drop
Chihiro Fushimi, Kazuhiko Madokoro, Shuiliang Yao, Yuichi Fujioka, Koichi Yamada
3:40 PMInertial Gas Admixtures in Pecvd for Uv Absorbing Thin Films of Titanium Dioxide on Polymers
Axel Sonnenfeld, Philipp Rudolf von Rohr
4:05 PMPlasma Treatment of Low Density Polyethylene (Ldpe) Using an Low-Temperature Cascade Arc Torch
Mary Gilliam, Andrew Ritts, Qingsong Yu
4:30 PMDiagnostics of Inductive-Coupled Ch2f2/Cf4 Plasma Using Langmuir Probe and Quadruple Mass Spectrometry
Ta-Chin Wei, Chi-Hung Liu
4:55 PMPlasma Interface Engineered Coating Systems for Magnesium Alloys
Jin Zhang, YenFong Chan, Qingsong Yu

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