| Wednesday, 2 November 2005: 12:30 PM-3:00 PM | |||
| 301 (Cincinnati Convention Center) | |||
Applied Mathematics and Numerical Analysis (10d) | |||
| #375 - Simulation and Control of Electronic Materials Manufacturing Systems (10D06) | |||
| Contributions describing the development and/or application of advanced methods for modeling, optimization and control for microelectronics manufacturing processes are solicited. Theoretical areas of interest include, but are not limited to, multiscale model development, model reduction, state estimation and nonlinear controller design, real-time batch process control and optimization, novel sensors for monitoring and control, inferential sensors and control, integration of process modeling, control, and optimization. | |||
| CoChair: | Edmund G. Seebauer | ||
| Chair: | Antonios Armaou | ||
| 12:30 PM | 375a | Using High Fidelity Simulation in the Design of Experiments for Optimizing Etch Uniformity in Plasma Etching Reactors Nirmal Tatavalli Mittadar, Demetre J. Economou, Michael Nikolaou, Jingang Yi, Simon McClatchie, Puneet Yadav, Andrew D. Bailey III | |
| 12:55 PM | 375b | Application of a Geometrically-Based Uniformity Criterion for Film Uniformity Optimization in a Planetary Gallium Nitride Cvd System Rinku P. Parikh, Raymond A. Adomaitis | |
| 1:20 PM | 375c | Effects of Sampling Rate, Metrology Delay and Process Hold on the Stability of Run-to-Run Control An-Jhih Su, Cheng-Ching Yu, Babatunde A. Ogunnaike | |
| 1:45 PM | 375d | A New Bayesian Approach for Improved State Estimation in Semiconductor Manufacturing Processes Jin Wang, Q. Peter He | |
| 2:10 PM | 375e | Pls Based Run-to-Run Controller Junghui Chen, Fan Wang | |
| Sponsor: | Computing and Systems Technology Division | ||
| Cosponsors: | Materials Engineering and Sciences Division | ||
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