| Tuesday, 1 November 2005: 12:30 PM-3:00 PM | |||
| 301 (Cincinnati Convention Center) | |||
Electronics and Photonics (08e) | |||
| #206 - Chemical Vapor Deposition I (08E01) | |||
| We invite papers that present recent advances in Chemical Vapor Deposition (CVD). Topics traditionally covered in this session include: CVD reactor diagnostics and modeling, scale-up issues, equipment development, novel deposition precursors, precursor delivery systems, sensors and process control, gas-phase and surface chemical reaction mechanisms, kinetics, chemically reacting flow simulations, nucleation and growth models. Applications to microelectronics, optoelectronics, thin-film coatings, synthesis of nanowires & nanotubes, and new-material development are welcome. Papers illustrating non-traditional applications of Chemical Engineering to CVD research, materials processing and advances in chemical engineering science through CVD research are especially encouraged. | |||
| CoChair: | David S. Dandy | ||
| Chair: | Daniel D. Burkey | ||
| Part 1 | |||
| 12:30 PM | Welcoming Remarks | ||
| Part 2 | |||
| 12:35 PM | 206a | Preparation of Hydrophobic Multilayers on Solid Surfaces Anfeng Wang, Jeff Chinn, Xuemei Liang, Ting Cao, Haiying Tang, Steven O. Salley, Gregory W. Auner, K. Y. Simon Ng | |
| 12:55 PM | 206b | in Situ Real-Time Diagnostics for Studying the Structural Evolution of Nanocrystalline Silicon Thin Films during Plasma Deposition Radhika C. Mani, Eray S. Aydil | |
| 1:15 PM | 206c | Roll-to-Roll Initiated Chemical Vapor Deposition (Icvd) of Functional, Flexible Nanomaterials Malancha Gupta, Karen K. Gleason | |
| 1:35 PM | 206d | On-Line Apcvd of Sno2 Coatings on Glass Mingheng Li, James W. McCamy | |
| 1:55 PM | 206e | Metal Organic Chemical Vapor Deposition of Titanium Oxynitride Films Using Tetrakis(Diethylamino)Titanium Xuemei Song, Christos G. Takoudis | |
| 2:15 PM | 206f | Chemical Vapor Deposition of Palladium Seed Layers Gregory L. Griffin, Lidong Wang | |
| 2:35 PM | 206g | Deposition of WnXCY Using Allylimido Complexes CL4(Rcn)W(Nc3H5): Effect of Nh3 on Film Properties Hiral M. Ajmera, Tim Anderson, Laurel L. Reitfort, Lisa McElwee-White | |
| Part 3 | |||
| 2:55 PM | Concluding Remarks | ||
| Sponsor: | Materials Engineering and Sciences Division | ||
| Cosponsors: | Engineering Sciences and Fundamentals | ||
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