Thursday, 3 November 2005: 12:30 PM-3:00 PM
206 (Cincinnati Convention Center)

Electronics and Photonics (08e)

#486 - Advances in Nanolithography (08E13)
This session features papers concerning the advancement in lithography process for information and biological applications at the nanometer scale. The areas include photo/electron/ion-beam lithography and other emerging techniques like soft lithography, imprint lithography, directed self-assembly, shadow lithography, and scanning probe. Exemplary topics include (but not limit to) fundamental chemical processes in nanolithography, photoresist formulation, photopolymerization, photo/electron optics optimization, multilayer alignment technique, and new routes for high-throughput scalability.
CoChair:Bruce J. Hinds
Chair:Chih-hung (Alex) Chang
12:30 PM486aIntact Transfer of Layered Bionanocomposite Arrays
Neeraj Kohli, Robert M. Worden, Ilsoon Lee
12:55 PM486bEnhancement of Lithography Processes Using Co2: Co2-Modified Development and Post Applied Bake
Amy E. Zweber, Joseph M. DeSimone, Ruben G. Carbonell
1:20 PM486cDirected Self-Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures
Mark P. Stoykovich, Marcus Mueller, Sang Ouk Kim, Harun H. Solak, Erik W. Edwards, Juan J. De Pablo, Paul F. Nealey
1:45 PM486dSelective Growth of Zinc Oxide Nanowires Grown from Thin Film Multilayer Structure for Shadow Lithography
Bing Hu, Nitin Chopra, Bruce Jackson Hinds
2:10 PM486eLangmuir-Blodgett Technique as a Tool for the Synthesis of Nanostructures
Xiaowei Teng, Xinyi Liang, Hong Yang
2:35 PM486fMaterials and Processes and High Resolution Patterning Using Thermal Cantilever Array Lithography
Clifford L. Henderson, William P. King, Yueming Hua, Shubham Saxena
Sponsor:Materials Engineering and Sciences Division
Cosponsors:Nanoscale Science and Engineering Forum

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