Friday, 4 November 2005: 12:30 PM-3:00 PM
300 (Cincinnati Convention Center)

Electronics and Photonics (08e)

#609 - Reactor Design and Analysis for Electronic Materials (08E10)
Efficient reactor design is key for the optimised manufacturing of electronic materials. In this session we solicit papers describing recent advances in reactor design, optimisation, operation and control for the production of electronic materials, including (but not limited to) techniques such as CVD, etching, CMP, RTP, ALE, etc. Both experimental and computational/modelling papers will be featured. Papers focusing on novel experimental reactor and controller designs and on high-performance computing applications, including multi-scale modelling and modelling of reacting flows and surface kinetics are encouraged.
CoChair:Roger P. Pawlowski
Chair:Constantinos Theodoropoulos
12:30 PM Welcoming Remarks
12:32 PM609aGallium Nitride Thin Film Growth Chemistry Modeling and Experimental Validation within a Movpe Reactor Showerhead System
Rinku P. Parikh, Raymond A. Adomaitis, Gary W. Rubloff, Erin Robertson, Deborah Partlow, Darren Thomson, Michael Aumer
12:57 PM609bDevelopment of Generalized Design Criteria for Vertical Chemical Vapor Deposition Reactors
Joungmo Cho, T.J. Mountziaris
1:22 PM609cComputational Fluid Dynamics (CFD) Modeling of a Laser-Driven Aerosol Reactor
Yuanqing He, Suddha S. Talukdar, Mark T. Swihart
1:47 PM609dExperimental Results from a Spatially Programmable Chemical Vapor Deposition System
Ramaswamy Sreenivasan, Raymond A. Adomaitis, Gary W. Rubloff, Yuhong Cai
2:12 PM609eNon-Lithographic Micropatterning of Thin Crystal Film Layers and Bulk Micro-Machining Via Hydrogel Stamping
Stoyan K. Smoukov, Christopher J. Campbell, Kyle J.M. Bishop, Bartosz A. Grzybowski
2:37 PM Concluding Remarks
Sponsor:Materials Engineering and Sciences Division
Cosponsors:Catalysis and Reaction Engineering Division

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