Monday, 31 October 2005: 3:15 PM-5:45 PM
210 (Cincinnati Convention Center)

Low Pressure (01g)

#135 - Semiconductor Surface Chemistry (01G03)
This session will focus on fundamental chemistry on semiconductor surfaces.
CoChair:Jason F. Weaver
Chair:Katherine S. Ziemer
3:15 PMControl of Defect Concentrations in Silicon through Surface Chemistry
Ramakrishnan Vaidyanathan, Kapil Dev, Richard D. Braatz, Edmund G. Seebauer
3:35 PMAnalysis of Chemical Reactions between Radical Growth Precursors Adsorbed on Plasma-Deposited Silicon Thin-Film Surfaces
Tamas Bakos, Mayur S. Valipa, Dimitrios Maroudas
3:55 PMAdatom-Pair Chain Structures: Metastable Precursors to Island Formation on the Ge-Si(100) 2xn Alloyed Surface
Kyle J. Solis, Lance R. Williams, Brian S. Swartzentruber, Sang M. Han
4:15 PMOrganic Functionalization of Semiconductors Using Amino Acids; Quantum Resonance Coupling
Guilluame Dupont, Gang Zhang, Charles Musgrave
4:35 PMSic Surface Preparation by Hydrogen Cleaning for High-Temperature, High-Power Device Integration
Trevor L. Goodrich, Joseph Parisi, Katherine S. Ziemer
4:55 PMKinetics and Mechanism for Alkyl Monolayer Growth on Hydrogenated Si Surfaces
Madhava Kosuri, Henry Gerung, Qiming Li, Sang M. Han, Paulo E. Herrera-Morales, Jason F. Weaver
5:15 PMGrowth of Sic on the Si (001) 1x1 Sufrace Using Monomethyl- and Dimethyl-Silanes
Charter D. Stinespring, C.Y. Peng, A.A. Woodworth, Katherine S. Ziemer
Sponsor:Engineering Sciences and Fundamentals
Cosponsors:Materials Engineering and Sciences Division

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