Thursday, 3 November 2005: 3:15 PM-5:45 PM
Grand Ballroom B (Millennium Hotel)

High Pressure (01f)

#546 - Materials Synthesis and Processing with Supercritical Fluids II (01F04)
This session will focus on the use of supercritical fluids to achieve superior material properties or processing enhancements relative to conventional techniques. Papers are sought that provide fundamental understanding, process description, and characterization. Topics of interest include, but are by no means limited to the synthesis, processing and modification of novel particles, fibers, films, coatings and composite materials; the preparation and processing of nanomaterials; an well as advances in techniques including rapid expansion, antisolvents, self assembly and impregnation. Papers related to the application of supercritical fluids in the microelectronics and semiconductor industries are particularly encouraged.
CoChair:Rajesh Dave
Chair:Raashina Humayun
Part 1 
3:15 PMDevelopment of Supported Nanoparticulate Metal Complexes Using Compressed Carbon Dioxide as Antisolvent
Chad A. Johnson, Sarika Sharma, Bala Subramaniam, A.S Borovik
Part 2 
3:40 PMReductive Deposition of Cerium Oxide Films in Carbon Dioxide
Adam O'Neil, James J. Watkins
4:05 PMSynthesis of Metal Oxide Nanoaerogels Via a Sol-Gel Route in Supercritical CO2
Ruohong Sui, Amin S. Rizkalla, Paul A. Charpentier
Part 3 
4:30 PMCopper Chelation for Microelectronic Interconnects in Supercritical Carbon Dioxide
Randy Weinstein, Carol Bessel, Dorothy Skaf, Donna Omiatek, Laurel Grotzinger
4:55 PMCopper Etching Using Hexafluoroacetylacetone (Hfach) Dissolved in Supercritical Co2: a Kinetic Investigation
Michael L. Durando, Anthony J. Muscat
Part 4 
5:20 PMComparative Study of Covalent Molecular Assembly of Oligoimide Ultrathin Films in Supercritical Carbon Dioxide and Liquid Solvent
Sreenivasa Reddy Puniredd, M. P. Srinivasan
Sponsor:Engineering Sciences and Fundamentals
Cosponsors:Particle Technology Forum

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