Wednesday, 2 November 2005 - 2:00 PM
356f

Light Alkane Dehydrogenation Activity for [Gah]2+ Sites Involving Two Framework Aluminum in Ga-Hzsm-5 Catalysts: a Dft Pathway Analysis

Yogesh V. Joshi, Purdue University, FRNY 117B 480 Stadium Mall Drive, West Lafayette, IN 47907-2100 and Kendall T. Thomson, School of Chemical Engineering, Purdue University, FRNY 117B 480 Stadium Mall Drive, West Lafayette, IN 47907-2100.

Light alkane aromatization using shape selective MFI based catalysts is an important chemical process. Unfortunately, substantial cracking activity of unmodified HZSM-5 catalyst leads to large amounts of methane and ethane as undesired byproducts reducing the aromatization selectivity. This problem is overcome by incorporating additional dehydrogenation function in the form of extra-framework species like Ga, Zn and Pt.   However, there are varying opinions regarding the role of GaHX species in the alkane dehydrogenation.  Using electronic DFT methods, we have studied the catalytic activity of extra-framework [GaH]2+ species in the proximity of the two framework Al, and we propose this as a likely model for the most active Ga-related sites for alkane dehydrogenation.  We find that the dehydrogenation activation barriers correlate strongly with reducibility of the [GaH]2+ site (and hence the Al-Al distance in the dual site model)—consistent with Brønsted-Evans-Polanyi relationships.  The optimal Al-Al separation is governed by the interplay between two compensating reaction steps (C-H activation and H-H formation), exemplifying the applicability of the Sabatier principle for a distribution of the Al-pair sites in the zeolite.


See more of #356 - Fundamentals of Surface Reactivity from Ab Initio Modeling (T3008)
See more of Topical 3 - Multiscale Analysis in Chemical, Materials and Biological Processes

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