Preliminary Program subject to change
10B01 Process Control and Monitoring Applications
OverviewThis session deals with novel process control and monitoring applications. Papers describing real-time implementation of advanced process control and monitoring are of higher priority.
Primary SponsorSystems and Process Control (10b)

Chair

Tyler A. Soderstrom
Process Control Supervisor
ExxonMobil Chemical Co.
5000 Bayway Dr.
Baytown, TX 77520
Phone Number: 281-834-1000
Email: tyler.a.soderstrom@exxonmobil.com

CoChair

Juergen Hahn
Department of Chemical Engineering, Texas A& M University
College Station, TX 77843-3122
Phone Number: 979-845-3568
Email: hahn@tamu.edu
A Novel Mixed Product Run-to-Run Control Algorithm – Dynamic Ancova Approach
Ming-Da Ma, Center for Control and Guidance Technology, Harbin Institute of Technology, Harbin, 150001, Chu-Cheng Chang, Chemical Engineering Department, National Tsing-Hua University, HsinChu, 300, Taiwan, Shi-Shang Jang, Chemical Engineering Department, National Tsing-Hua University, Hsin-Chu, 300, Taiwan and David Shan-Hill Wong, Chemical Engineering Department, National Tsing-Hua University, HsinChu, 300
A Practical Approach to Advanced Process Control of VCM Plants
Ravi Nath1, Mike Yen1, Zak Alzein2 and Eric Wagner3, (1)Honeywell, 1250 W. Sam Houston Pkwy S., Houston, TX 77042, (2)Honeywell, 2500 W Union Hills Drive, Phoenix, AZ 85027, (3)Technip USA, 555 West Arrow Highway, Claremont, CA 91711
Direct Control of Chemical Processes with Multi-Rate Measurements
Sairam Valluri, Control Systems Engineering, Lyondell Chemical Company, 2502 Sheldon Road, PO Box 30, Channelview, TX 77530 and John Jordan, Lyondell Chemical Company, 2502 Sheldon Road, PO Box 30, Channelview, TX 77530
Model Based Online Analysis and Monitoring of Tank Qualities
Suresh S. Agrawal, Offsite Management Systems LLC, 3311 Stoney Mist Dr., Sugar Land, TX 77479
Development of in-Situ Analysis for the Chemical Industry
J.D. Tate, The Dow Chemical Company, 2301 N. Brazosport Blvd., Freeport, TX 77541 and Trevor Knittel, Analytical Specialties Inc., 910 Gemini, Houston, TX 77058
Process Monitoring Using Robust Chemometric Spectrum Models for Predicting Concentration Profiles
Uwe Kruger1, Yan Zhou2, David Rooney3, Xun Wang2 and Jillian Thompson3, (1)Electronics, Electrical Engineering and Computer Science, Queen's University Belfast, Ashby Building, Stranmillis Road, Belfast, BT9 5AH, United Kingdom, (2)Electronics, Electrical Engineering and Computer Science, Queen's Univeristy Belfast, Ashby Building, Stranmillis Road, Belfast, BT9 5AH, United Kingdom, (3)Chemistry and Chemical Engineering, Queen's University Belfast, David Keir Building, Stranmillis Road, Belfast, BT9 5AG, United Kingdom

Computing and Systems Technology Division