Preliminary Program subject to change
01C16 Fundamentals of Interfacial Phenomena II
OverviewFundamentals
Primary SponsorInterfacial Phenomena (01c)

Chair

H. Michael Cheung
Chemical Engineering
University of Akron
200 E. Buchtel Commons
Akron, OH 44325
Phone Number: 330-972-7282
Fax Number: 330-972-5856
Email: cheung@uakron.edu

CoChair

Joelle Frechette
Assistant Professor
Chemical and Biomolecular Engineering
Johns Hopkins University
220 Maryland Hall
3400 N. Charles St.
Baltimore, MD 21231
Phone Number: 410-516-0113
Fax Number: 410-516-5510
Email: jfrechette@jhu.edu

CoChair

Seong H. Kim
Associate Professor
Penn State University
118-B Fenske Lab
University Park, PA 16802-4400
Phone Number: 814-863-4809
Fax Number: 814-865-7846
Email: shkim@engr.psu.edu
Adhesion and Detachment Mechanisms of Polymer Thin Films
Hongbo Zeng1, Jacob N. Israelachvili1, Matthew Tirrell2 and L. Gary Leal3, (1)Chemical Engineering, University of California at Santa Barbara, 3357 Engineering II, Santa Barbara, CA 93106-5080, (2)Chemical Engineering, University of California, Santa Barbara, 3357 Engineering II, Santa Barbara, CA 93106-5080, (3)Chemical Engineering, University of California, Santa Barbara, Engineering 2, Rm 3357, Santa Barbara, CA 93106
Interface Mixing Behavior of Lennard-Jones Fcc (100) Thin Film
Panji Gazali, Nanyang Technological University, 62 Nanyang Drive, Singapore, 637459, Singapore and Sang Kyu Kwak, Division of Chemical and Biomolecular Engineering, Nanyang Technological University, 62 Nanyang Drive, Singapore, 637459, Singapore
Investigations of Transient and Equilibrium Zeta Potential on Mica and Silica
Danish Faruqui, Paul J. Sides and Andrew J. Gellman, Chemical Engineering, Carnegie Mellon University, 5000 Forbes Ave, Pittsburgh, PA 15213
Mechanism of ADSORPTION of Anionic Surfactants on the Surface of Functionalized NANOPARTICLES
Paolo Arosio, Hua Wu, Alessio Zaccone, Marco Lattuada and Massimo Morbidelli, Dep. of Chemistry and Applied Bioscience, ETH Zurich, W. Pauli Strasse 10, Zurich, 8093, Switzerland
Spectral and Morphological Characterization of a Vapor-Deposited Thin Silica Film
A. Anderson and W. Robert Ashurst, Chemical Engineering, Auburn University, 212 Ross Hall, Auburn, AL 36849

Engineering Sciences and Fundamentals