| Preliminary Program subject to change |
| 01G01 Semiconductor Surface Chemistry |
| This session will focus on fundamental chemistry on semiconductor surfaces. |
| Low Pressure (01g) |
Chair
Alan E. Nelson
Corporate Research and Development
The Dow Chemical Company
Building 1776
Midland, MI 48674
Phone Number: 989-638-3525
Email: aenelson@dow.com
CoChair
Aravind R. Asthagiri
Assistant Professor
Chemical Engineering
University of Florida
427 ChE Bldg
PO Box 116005
Gainesville, FL 32611-6005
Phone Number: 352-392-0868
Fax Number: 352-392-9513
Email: aasthagiri@che.ufl.edu
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Investigation of Roles of Chloride and Polyethylene Glycol In Copper Electrochemical Deposition
Hung-Ming Chen, Satish J. Parulekar and Alan Zdunek, Chemical and Biological Engineering Department, Illinois Institute of Technology, 127 Perlstein Hall, 10 W. 33rd Street, Chicago, IL 60616 |
Molecular Beam Epitaxy Integration of Barium Hexaferrite on Wide Bandgap Semiconductor 6H-Sic
Zhuhua Cai1, Trevor L. Goodrich1, Zhaohui Chen2, Fan Yang2, Vince Harris2 and Katherine S. Ziemer1, (1)Chemical Engineering, Northeastern University, 360 Huntington Avenue, Boston, MA 02115, (2)Department of Electrical and Computer Engineering, Northeastern University, 360 Huntington Ave, Boston, MA 02115 |
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