| Wednesday, November 7, 2007: 3:30 PM-6:00 PM | |||
| Room 251 C (Salt Palace Convention Center) | |||
Electronics and Photonics (08e) | |||
| #456 - Atomic Layer Deposition (08E04) | |||
| This session focuses on the deposition of ultrathin films by atomic layer deposition. It focuses on topics ranging from new ALD chemistries and films, process characteristics, chemical mechanisms, surface science, substrate effects, deposition on particles and properties of ALD deposited films. | |||
| Chair: | Charles Musgrave | ||
| CoChair: | Stacey F. Bent | ||
| 3:30 PM | 456a | First Priniciples Calculation Of Atomic Layer Deposition Of HfO2 Atashi Mukhopadhyay, Javier Fdez. Sanz, Charles Musgrave | |
| 3:55 PM | 456b | Atomic Layer Deposition Of Optically Active Zno And TiO2 Nanothick Films On Particles David M. King, Xinhua Liang, Xiaohua Du, Jarod A. McCormick, Steven M. George, Alan W. Weimer | |
| 4:20 PM | 456c | Material Characteristics And Electrical Properties Of Hafnium Silicate Films Synthesized By Plasma Enhanced Atomic Layer Deposition Jiurong Liu, Ryan M. Martin, Monica Sawkar, Jane P. Chang | |
| 4:45 PM | 456d | Quantum Molecular Dynamics Simulations Of The Ald Of HfO2 Charles Musgrave, Atashi Mukhopadhyay, Javier Sanz | |
| 5:10 PM | 456e | Surface Reaction Engineering For Oxide Heteroepitaxy On Si(100)-2x1 Brian G. Willis, D.B. Skliar, A. Mathew | |
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