Wednesday, November 7, 2007: 12:30 PM-3:00 PM
Room 151 G (Salt Palace Convention Center)

Electronics and Photonics (08e)

#446 - Reaction Kinetics In Electronic Materials Processing (08E03)
Bulk gas phase and liquid phase reactions, reactions in plasmas, and reactions occurring at gas-solid, solid-liquid and solid-solid interfaces are essential to the fabrication of modern electronic devices. This session is focused on topics related to the evaluation and control of reaction kinetics during the processing of electronic materials, including experimental evaluations and modeling and simulation efforts.
Chair:Heath Turner
CoChair:Katherine S. Ziemer
12:30 PM446aDefect Engineering For Ultrashallow Junctions Using Surfaces
Edmund G. Seebauer, Charlotte Kwok, Ramakrishnan Vaidyanathan, S.H. Yeong, M. P. Srinivasan, B. Colombeau, L. Chan
12:50 PM446bAtomic-Scale Analysis Of The Role Of Surface Cordination Defects In The Growth Of Amorphous Silicon Thin Films
Mayur S. Valipa, Tejinder Singh, Dimitrios Maroudas
1:10 PM446cAb-Initio Study on Zinc Sulfide Formation Mechanism in A Cvd Reactor
Yousef Sharifi, Luke E. K. Achenie
1:30 PM446dHot Wire Chemical Vapor Deposition Kinetics For Germanium Nanoparticle Growth On Extended And Patterned Hafnia Surfaces
John G. Ekerdt, Shawn S Coffee
1:50 PM446eIn-Situ Characterization of Dynamics of Impurity Absorption and Outgassing in Porous Low-K Dielectric Thin Films
Asad Iqbal, Junpin Yao, Harpreet Juneja, Farhang Shadman, Roger P Sperline
2:10 PM446fReaction Rates And Mechanism For The Deposition Of Ruthenium Thin Films From Supercritical Carbon Dioxide
Christos F. Karanikas, James J. Watkins
2:30 PM446gStudy of Low-K Film Repair and Pore Sealing Using Chlorosilanes Dissolved in Supercritical Carbon Dioxide
Eduardo Vyhmeister, David Suleiman, L. Antonio Estévez, Anthony J. Muscat

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