Monday, November 5, 2007 - 9:50 AM
40e

The Effect Of Image Forces Upon Polyelectrolyte Adsorption

Scott K. Stanley, Vivek M. Prabhu, Eric K. Lin, and Wen-li Wu. Polymers Division, National Institute of Standards and Technology, 100 Bureau Drive, Stop 8541, Gaithersburg, MD 20899

Adsorption of charged macromolecules, i.e. polyelectrolytes (PE), is of interest for numerous applications including layer-by-layer assembly of thin films, membranes, controlled adhesion of biomolecules to surfaces, and photoresist dissolution.  Oftentimes the solution pH and ionic strength are studied to understand how electrostatics affect PE adsorption; however, the relative dielectric properties of the solvent and surface have received far less attention.  Recent theoretical work predicts that image-charge-induced image forces should play a role in determining adsorption kinetics, adsorbed amount, and adsorbate structure when there is a large dielectric discontinuity between solvent and substrate. This talk presents the experimentally measured effects of image forces on the adsorption of PE onto oxide dielectric surfaces.  Surfaces ranging in dielectric constant of 4-40 (SiO2 and TiO2) are used with solvent mixtures of dielectric constant 80-20 (water and alcohol mixtures).  Polyelectrolyte adsorption amount and kinetics are determined in situ and in real time using a liquid phase quartz crystal microbalance cell with optical reflectivity probe.  The chemical and physical nature of substrates and adsorbed polymer layers are studied with x-ray photoelectron spectroscopy (XPS) and x-ray reflectivity (XRR).  Conformation and coverage of the adsorbed polyelectrolyte layer are determined in situ using neutron reflectivity with deuterated solvents in a liquid cell.  Experimental results scale well with theoretical expectations for image charge effects and suggest that image forces can be used to direct assembly of polyelectrolytes to patterned areas of a surface based on the dielectric properties of the solvent and substrate.  The effects of buried regions of dielectric contrast are investigated to pattern adsorption based on image forces.



Web Page: polymers.nist.gov/staff/detail.cfm?SID=436